
LASER DIRECT WRITER
Micro patterning for device fabrication
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Maskless Photolithography drawing micro patterns
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Circular mode: CAD pattern (5 layers w/ different doses)
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Raster mode: image file (BW Image pixels: 1000 x 1000)
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Vector mode: line drawing by mousing drawing
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Light source: UV laser (405 nm) beam
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Objective lens: 5x, 10x, 20x, 50x, 100x
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hardware: XYZ motorized micro-stage and optical microscope
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writing software: compatitble for CAD file (dxf), and BW image file and Mouse drawing line patterns paths
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vector line drawing: The user draws lines directly with the mouse while looking at the microscope image of sample, and the scanner draws a pattern along these lines.
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maximum writing speed: 600 um/sec
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minimum spot size: 1 um
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2 writing modes: area filling with low resolution + line drawing with high resolution
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Photoresist: compatible for general optical lithography PR
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Applications: solar cell electrodes, big electrodes in micro-device, contact pad for device, microfluidics device
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XY stage with substrate tilt correction
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Price: ~$23,000